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CAS No. 7440-25-7

分子式 Ta

分子量 180.95

英文名称 Tantalum

中文同义词钽粉,-100目,PURATRONIC|R,99.98%(METALSBASIS),NB50PPM;钽溅射靶,76.2MM(3.0IN)DIAX6.35MM(0.250IN)THICK,99.95%(METALSBASISEXCLUDINGNB);钽柱体,3.175MM(0.125IN)DIAX3.175MM(0.125IN)LENGTH,99.95%(METALSBASIS);钽柱, 3.175MM (0.125IN) 直径 X 3.175MM (0.125IN) 长, 99.95% (METALS BASIS);钽粉, APS≈2微米, 99.9% (METALS BASIS);钽线, 0.05MM (0.002IN) 直径, 退火, 99.9% (METALS BASIS);钽薄箔, 0.0025MM (0.0001IN) 厚, 99.9% (METALS BASIS);钽箔, 1.0MM (0.04IN) 厚, 99.95% (METALS BASIS)

EINECS号 231-135-5

MDL No. -

溶解性 -

熔点 2996 °C (lit.)

密度 16.69 g/cm3 (lit.)

沸点 5425 °C (lit.)

编辑结构

同义词

钽粉,-100目,PURATRONIC|R,99.98%(METALSBASIS),NB50PPM 钽溅射靶,76.2MM(3.0IN)DIAX6.35MM(0.250IN)THICK,99.95%(METALSBASISEXCLUDINGNB) 钽柱体,3.175MM(0.125IN)DIAX3.175MM(0.125IN)LENGTH,99.95%(METALSBASIS) 钽柱, 3.175MM (0.125IN) 直径 X 3.175MM (0.125IN) 长, 99.95% (METALS BASIS) 钽粉, APS≈2微米, 99.9% (METALS BASIS) 钽线, 0.05MM (0.002IN) 直径, 退火, 99.9% (METALS BASIS) 钽薄箔, 0.0025MM (0.0001IN) 厚, 99.9% (METALS BASIS) 钽箔, 1.0MM (0.04IN) 厚, 99.95% (METALS BASIS)